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Basics of high barrier vapor-deposited films and coating technology, functional enhancement, development examples.

Detailed introduction of vacuum deposition technology, ion plating technology, plasma CVD, binary deposition technology, etc. Also introducing continuous vacuum deposition machines.

【Lecturer】 Yoshifumi Ito, Professor, Doctor of Engineering, Kurume National College of Technology, Department of Applied Biological Chemistry 【Venue】 Kawasaki City Industrial Promotion Hall, Room 5 【Kanagawa, Kawasaki Station】 【Date and Time】 October 28, 2010 (Thursday) 13:00 - 16:30    【Lecture ends at 16:00. 16:00-16:30: Free time Q&A】

  • Vacuum Packaging Machine
  • Packaging materials
  • Technical Seminar

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Fundamentals and High Functionality of High Barrier Vapor Deposition Films: Comparative Analysis of Characteristics in Development Examples

★Detailed introduction of vacuum deposition technology, ion plating technology, plasma CVD, binary deposition technology, etc.! ★Introduction of continuous vacuum deposition machines as well!

Lecturer Professor Yoshifumi Ito, Ph.D. Department of Applied Biological Chemistry, Kurume National College of Technology Target Audience: Engineers, researchers, and beginners interested in high barrier vapor deposition films Venue: Room 504, L Osaka [Osaka City] 300m west from Tenmabashi Station on the Tanimachi Subway Line and Keihan Electric Railway Date and Time: June 27, 2011 (Monday) 13:00-16:30 Capacity: 30 people *Registration will close once full. Please apply early. Participation Fee: 49,350 yen (including tax and textbook costs) for up to 2 people from one company ⇒ ◆ Invoices for 2 people can be split into 2 payments (please indicate your preference in the remarks section) *New members registering for the first time by June 13 will receive an early bird discount price of 44,100 yen ◆ If 3 people from the same corporation apply, the fee is 67,200 yen.

  • Company:AndTech
  • Price:10,000 yen-100,000 yen
  • Technical Seminar

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